Photo Liquid/Resist  
Metallization Circuit
Formation
Imaging
Systems
Final
Finishes
Interconnect Emerging
Technologies
OEM & Assembly Equipment
& Services
Imaging Systems > Photo Liquid/Resist
 
Microtrace Technology
An excellent imaging for innerlayers, Microtrace is in the forefront of liquid photoresist technology. With proven systems in place around the world, this advanced photoresist offers high yield, high volume production at a significantly reduced cost.



Microtrace is compatible with both alkaline and acid etching chemistries and, unlike most liquid resists, Microtrace coated panels are stackable for over 48 hours. The benefits of automation and production proven liquid resist technology combine to create a low cost, high production alternative to conventional dry film processes.

- Fully aqueous processable
- Stackable after coating
- Excellent photospeed
- Excellent printout image
- One year storage stability

Microtrace is easy to apply with any of the leading horizontal & vertical roller coating equipment lines.

Microtrace integrated technology generates accurate imaging down to 2 mils without compromising quality. And, utilizing this fully automated system, productivity can be improved to process approximately 6,000 cores per day at 3.5 m (11.5 ft.) per second.
 
SEM of Microtrace imaging: Microtrace 1405 imaged at1 mil line, 50 micron pitch
   
A multilayer BGA
device with micrographic imaging requires the precision of Microtrace to generate 2 mil features (actual size photo)
 

Photo Liquid / Resist , Dry Film Products and Laser Imaging Products.